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Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250'' - Nanografi Advanced Materials

Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250'' - Nanografi Advanced Materials
Regular price Rp 5.067.000,00
Regular price Sale price Rp 5.067.000,00
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This iron (Fe) sputtering target is a metal target used in physical vapor deposition (PVD) sputtering systems to deposit thin iron films onto substrates. Iron belongs to the transition metal group and is widely studied for its magnetic and structural properties in thin-film form. The target is supplied as a disc in the dimensions stated in the product title, with a purity of 99.95%.

  • Quantity: 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotation, please contact AMI Scientific.

  • Deposition of magnetic thin films for research on magnetic recording and spintronic devices
  • Fabrication of metallic contact and electrode layers in thin-film device prototypes
  • Surface coating studies and thin-film growth experiments in materials science laboratories

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