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Nanografi

Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125'' - Nanografi Advanced Materials

Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125'' - Nanografi Advanced Materials
Regular price Rp 7.815.000,00
Regular price Sale price Rp 7.815.000,00
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Iron (Fe) sputtering targets are solid metal discs used as the source material in physical vapor deposition (PVD), particularly magnetron sputtering. During deposition, energetic ions eject atoms from the target surface, which then condense onto a substrate to form a thin film. Iron is a transition metal, so this target belongs to the metallic sputtering target group.

  • Quantity: 1 piece

For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.

  • Deposition of iron-based thin films for magnetic and spintronic device research
  • Preparation of metallic coatings for surface science and materials studies
  • Fabrication of multilayer and alloy films for academic and industrial R&D
  • Thin-film electrode and conductive layer studies

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