This Nanografi iron oxide (Fe3O4) sputtering target is a 99.9% pure disc measuring 3'' in size with a thickness of 0.250''. It serves as the source material in sputter deposition, where atoms are eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering can coat a broad range of substrate shapes and sizes, and the process is repeatable. It suits small research and development work and can be scaled to production batches covering medium to large substrate areas.
Depending on process settings, chemical reactions may take place at the target surface, in flight, or on the substrate. The many adjustable parameters make sputtering a complex technique, but they give experienced users considerable control over film growth and microstructure.
- Thin film deposition of iron oxide onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Material analysis by sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
- Studies related to space weathering, where sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01FE21
- Material: Iron Oxide (Fe3O4)
- Size: 3''
- Thickness: 0.250''
- Product code: NG0ST01FE21
—
—