Iron Oxide (Fe3O4) sputtering targets are solid, sputter-ready source materials made from magnetite, a mixed-valence iron oxide belonging to the spinel oxide family. They are nanomaterial-grade products from Nanografi, designed for physical vapor deposition systems that form thin films of iron oxide on substrates for research and development.
- Quantity: 1 piece
For technical specifications, Certificate of Analysis (CoA), or a quotation, please contact AMI Scientific.
- Deposition of magnetic thin films for magnetic materials research
- Fabrication of oxide layers for spintronic and magnetic device studies
- Development of functional coatings for catalysis and surface science experiments
- Thin-film process optimization in university and industrial laboratories
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