This Nanografi iron oxide (Fe3O4) sputtering target is a 99.9% purity source material for thin film work, supplied as a single piece measuring 6'' with a thickness of 0.250''.
In sputter deposition, material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer. The method works on substrates of many shapes and sizes, gives repeatable results, and can move from small research projects to production batches covering medium to large substrate areas.
Depending on process conditions, chemical reactions may take place on the target surface, in flight or on the substrate. Because so many parameters can be tuned, experienced users gain considerable control over film growth and microstructure.
- Thin film deposition onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Compositional analysis such as secondary ion mass spectrometry (SIMS), where sputtered atoms are measured to identify composition and trace impurities.
- Research related to space weathering, where sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01FE27
- Material: Iron Oxide (Fe3O4)
- Size: 6''
- Thickness: 0.250''
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