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Nanografi

Lead (Pb) Sputtering Targets

Lead (Pb) Sputtering Targets
Regular price Rp 7.312.000,00
Regular price Sale price Rp 7.312.000,00
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Lead (Pb) sputtering targets are solid metal sources made from elemental lead, designed for physical vapor deposition (PVD) processes such as DC or RF magnetron sputtering. During sputtering, energetic ions eject lead atoms from the target surface, which then condense onto a substrate to form thin films. Lead is a dense, soft, heavy metal, so its targets fall within the metallic sputtering material group used in thin-film research and development. Because lead is toxic, handling should follow appropriate laboratory safety procedures.

  • 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotation, please contact AMI Scientific.

  • Deposition of metallic lead thin films for fundamental materials research
  • Fabrication of lead-containing perovskite and piezoelectric film studies
  • Radiation shielding coating research
  • Development of electrical contact and interlayer thin films

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