Lead (Pb) sputtering targets are solid metallic discs or plates used as the source material in physical vapor deposition (PVD) processes, such as DC or RF magnetron sputtering. Lead is a heavy post-transition metal, and sputtering targets of this type are used to deposit lead-based thin films onto substrates for research and development. Nanografi sputtering targets are intended for laboratory-scale thin film work.
- 1 piece
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- Deposition of lead metal thin films for materials science research
- Fabrication of multilayer and test structures in thin-film electronics studies
- Development of experimental coatings on glass, silicon, and other substrates
- Academic investigation of sputtering process parameters and film growth
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