This lead zirconium titanate (PZT, O5PbTiZr) sputtering target has a purity of 99.9%, a size of 3'' and a thickness of 0.125''. It serves as the source material for depositing PZT thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
PZT is an inorganic ceramic with a perovskite structure and a strong piezoelectric effect: it changes shape when an electric field is applied. This property makes it useful in devices such as ultrasonic transducers and piezoelectric resonators.
PZT films can be prepared by several routes, including sol-gel processing, pulsed laser deposition, MOCVD and RF magnetron sputtering. RF magnetron sputtering is regarded as a reliable option because it yields uniform films with smooth surfaces. Sputter deposition is repeatable, scales from small R&D work to production batches on medium to large substrates, and its many process parameters give close control over film growth and microstructure.
- Deposition of PZT thin films onto substrates such as silicon wafers by RF magnetron sputtering.
- Fabrication of piezoelectric films for ultrasonic transducers and piezoelectric resonators.
- Research and development work on thin films that can later be scaled up to production batches.
- Sputter etching where high etching anisotropy is needed and selectivity is not a concern.
- Compositional analysis by sputtering, as in secondary ion mass spectrometry (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | O5PbTiZr |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01LE51
- Material: Lead Zirconium Titanate (PZT)
- Size: 3''
- Thickness: 0.125''
—
—