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Nanografi

Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets

Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets
Regular price Rp 71.328.000,00
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This lead zirconium titanate (PZT, O5PbTiZr) sputtering target is a 99.9% purity source material measuring 6'' in size and 0.250'' thick. It is intended for physical vapour deposition of PZT thin films onto substrates such as silicon wafers.

PZT is an inorganic ceramic with a perovskite structure and a pronounced piezoelectric effect: it deforms when an electric field is applied. This behaviour makes it a key material for ultrasonic transducers and piezoelectric resonators.

PZT films can be prepared by sol-gel processing, pulsed laser deposition, MOCVD and RF magnetron sputtering. RF magnetron sputtering is regarded as a dependable route because it yields uniform films with smooth surfaces. Sputter deposition is repeatable, scales from small R&D work up to production batches on medium to large substrate areas, and its many process parameters give experienced users close control over film growth and microstructure.

  • Deposition of PZT thin films by RF magnetron sputtering onto substrates such as silicon wafers.
  • Fabrication of piezoelectric films for ultrasonic transducers.
  • Development of thin-film piezoelectric resonators.
  • Sputter etching where high etching anisotropy is required and selectivity is not a concern.
  • Compositional analysis such as secondary ion mass spectrometry (SIMS), where material is sputtered at a constant rate.

Brand Nanografi
CAS number —
Molecular formula —
Purity 99.9%
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Pack sizes 1 piece
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  • Product code: NG0ST01LE58
  • Material: Lead Zirconium Titanate/PZT (O5PbTiZr)
  • Size: 6''
  • Thickness: 0.250''
  • Product code: NG0ST01LE58

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