This Nanografi lithium phosphate (Li3PO4) sputtering target is a 1'' disc with a thickness of 0.125'' and a purity of 99.95%. It serves as the source material in sputter deposition systems, where atoms are eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering can coat substrates of many shapes and sizes, and it gives repeatable results that scale from small research and development work to production batches covering medium to large substrate areas. Depending on the process parameters, chemical reactions may take place at the target surface, in flight or on the substrate.
Because the process has many adjustable parameters, experienced users gain a high level of control over film growth and microstructure.
- Deposition of lithium phosphate thin films onto substrates such as silicon wafers.
- Sputter etching where a high degree of etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, for example in secondary ion mass spectroscopy (SIMS) to determine composition and detect very low impurity levels.
- Research and development work that can later be scaled up to medium and large substrate areas.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01LI25
- Material: Lithium Phosphate (Li3PO4)
- Size: 1''
- Thickness: 0.125''
- Product code: NG0ST01LI25
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