This lithium phosphate (Li3PO4) sputtering target from Nanografi has a purity of 99.95%, a size of 1'' and a thickness of 0.250''. It is a source material for depositing thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Sputter deposition can coat many substrate shapes and sizes, gives repeatable results, and can move from small research and development work to production batches covering medium to large substrate areas. Depending on process settings, chemical reactions may take place on the target surface, in flight or on the substrate. The many adjustable parameters give experienced users close control over film growth and microstructure.
- Thin film deposition onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, as in secondary ion mass spectroscopy (SIMS), to determine composition and detect very low impurity levels.
- Studies related to space weathering of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01LI26
- Material: Lithium Phosphate (Li3PO4)
- Size: 1''
- Thickness: 0.250''
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