This lithium phosphate (Li3PO4) sputtering target from Nanografi is a 4'' target with a thickness of 0.250'' and a purity of 99.95%. It serves as the source material in sputter deposition systems, where atoms eroded from the target build up a thin film on a substrate such as a silicon wafer.
Sputtering is an established route to thin films and works on substrates of many shapes and sizes. The process is repeatable and scales from small research and development work up to production batches covering medium to large substrate areas. Depending on the process settings, chemical reactions may take place at the target surface, in flight or on the substrate itself.
Because sputter deposition involves many adjustable parameters, it is a demanding technique, but it gives experienced users considerable control over film growth and microstructure.
- Deposition of lithium phosphate thin films onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Material analysis by controlled sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect trace impurities.
- Research into space weathering, in which sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01LI32
- Material: Lithium Phosphate (Li3PO4)
- Size: 4''
- Thickness: 0.250''
- Product code: NG0ST01LI32
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