This lithium phosphate (Li3PO4) sputtering target from Nanografi has a purity of 99.95%, a size of 6'' and a thickness of 0.250''. It serves as the source material for depositing Li3PO4 thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Sputter deposition can coat substrates of many shapes and sizes, and the process is repeatable. It suits small research and development work and can be scaled up to production batches covering medium to large substrate areas.
Depending on process settings, chemical reactions may take place at the target surface, in flight or on the substrate. The large number of adjustable parameters makes sputtering complex, but it gives experienced users fine control over film growth and microstructure.
- Thin film deposition of lithium phosphate onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Material analysis by sputtering, as in secondary ion mass spectroscopy (SIMS), to determine composition and detect trace impurities.
- Research and development projects that may later be scaled up to larger production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01LI36
- Material: Lithium Phosphate (Li3PO4)
- Size: 6''
- Thickness: 0.250''
- Product code: NG0ST01LI36
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