This lithium titanate (Li2TiO3) sputtering target from Nanografi has a purity of 99.95%, a diameter of 3'' and a thickness of 0.125''. It is supplied as one piece with indium bonding and serves as the source material for depositing lithium titanate thin films by sputtering.
Sputter deposition is an established way to coat substrates of many shapes and sizes. The process is repeatable and scales from small research and development work to production batches covering medium to large substrate areas. Depending on the process settings, chemical reactions can take place on the target surface, in flight or on the substrate, and the many adjustable parameters give experienced users close control over film growth and microstructure.
- Thin film deposition, eroding material from the target onto a substrate such as a silicon wafer.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Materials analysis such as secondary ion mass spectroscopy (SIMS), where sputtered atoms are identified to determine composition and detect trace impurities.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01LI54
- Material: Lithium Titanate (Li2TiO3)
- Size: 3''
- Thickness: 0.125''
- Bonding: Indium
- Product code: NG0ST01LI54
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