This lithium titanate (Li2TiO3) sputtering target from Nanografi has a purity of 99.95%, a diameter size of 4'' and a thickness of 0.250''. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film on a substrate such as a silicon wafer.
Sputtering can coat substrates of many shapes and sizes and gives repeatable results. A process developed in small research projects can be scaled up to production batches covering medium to large substrate areas. Depending on process parameters, chemical reactions may take place on the target surface, in flight or on the substrate. The number of adjustable parameters makes sputtering complex, but it also gives experienced users close control over film growth and microstructure.
- Deposition of lithium titanate thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Materials analysis by etching away target material, as in secondary ion mass spectrometry (SIMS).
- Research and development work that can later be scaled up to medium or large substrate areas.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01LI52
- Material: Lithium Titanate (Li2TiO3)
- Size: 4''
- Thickness: 0.250''
- Product code: NG0ST01LI52
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