This magnesium fluoride (MgF2) sputtering target is a 1'' disc, 0.125'' thick, with a purity of 99.9%. It serves as the source material in sputter deposition, where material is eroded from the target and laid down as a thin film on a substrate such as a silicon wafer.
Sputtering is an established route to thin films from many materials onto substrates of different shapes and sizes. The process is repeatable, works for small research and development runs, and can be adapted to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place on the target surface, in flight or on the substrate. The number of variables makes sputter deposition complex, but it gives experienced users considerable control over film growth and microstructure.
- Deposition of MgF2 thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not critical.
- Analytical work such as secondary ion mass spectrometry (SIMS), where material is sputtered at a constant rate and the ejected atoms are identified by mass spectrometry.
- Research and development deposition runs that can later be scaled to larger substrate areas.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MG27
- Material: Magnesium Fluoride (MgF2)
- Size: 1''
- Thickness: 0.125''
- Product code: NG0ST01MG27
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