Magnesium fluoride (MgF2) sputtering targets are dense inorganic fluoride ceramic sources used in physical vapor deposition to form thin films. As a wide-bandgap dielectric material, MgF2 is widely studied for optical and protective coatings where a low refractive index and good transparency are important. Sputtering targets are supplied in solid form and are mounted in compatible sputtering systems to deposit uniform films onto substrates.
- 1 piece
For technical specifications, certificate of analysis (CoA), or a quotation, please contact AMI Scientific.
- Anti-reflective and optical interference coatings
- Dielectric and protective thin-film layers in optics research
- Thin-film deposition process development in laboratories
- Substrate coating studies for photonic and optoelectronic devices
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