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Magnesium Fluoride (MgF2) Sputtering Targets

Magnesium Fluoride (MgF2) Sputtering Targets
Regular price Rp 16.523.000,00
Regular price Sale price Rp 16.523.000,00
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Magnesium fluoride (MgF2) sputtering targets are dense inorganic fluoride ceramic sources used in physical vapor deposition to form thin films. As a wide-bandgap dielectric material, MgF2 is widely studied for optical and protective coatings where a low refractive index and good transparency are important. Sputtering targets are supplied in solid form and are mounted in compatible sputtering systems to deposit uniform films onto substrates.

  • 1 piece

For technical specifications, certificate of analysis (CoA), or a quotation, please contact AMI Scientific.

  • Anti-reflective and optical interference coatings
  • Dielectric and protective thin-film layers in optics research
  • Thin-film deposition process development in laboratories
  • Substrate coating studies for photonic and optoelectronic devices

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