This magnesium fluoride (MgF2) sputtering target from Nanografi has a purity of 99.9%, a size of 2'' and a thickness of 0.250''. It serves as the source material for sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established method for coating substrates of many shapes and sizes. It gives repeatable results and can be scaled from small research and development work up to production batches covering medium to large substrate areas. Depending on the process parameters, chemical reactions may take place on the target surface, in flight or on the substrate. The number of adjustable parameters makes the process complex, but it gives experienced users close control over film growth and microstructure.
- Deposition of MgF2 thin films onto substrates such as silicon wafers.
- Sputter etching where a high degree of etching anisotropy is required and selectivity is not a concern.
- Analytical work such as secondary ion mass spectrometry (SIMS), where material is sputtered at a constant rate to determine composition and detect very low impurity levels.
- Research and development projects that may later scale up to production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MG30
- Material: Magnesium Fluoride (MgF2)
- Size: 2''
- Thickness: 0.250''
- Product code: NG0ST01MG30
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