This Nanografi magnesium fluoride (MgF2) sputtering target is a 3'' disc, 0.250'' thick, with a purity of 99.9%. It serves as the source material in sputter deposition systems used to grow thin films on substrates such as silicon wafers.
Sputter deposition works by eroding material from the target and transferring it to the substrate. The method handles substrates of many shapes and sizes, gives repeatable results, and can move from small R&D runs to production batches covering medium to large areas.
Depending on process settings, chemical reactions may take place at the target surface, in flight or on the substrate. The large number of adjustable parameters makes the process complex, but it gives experienced users close control over film growth and microstructure.
- Thin film deposition onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not critical.
- Material analysis by sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect trace impurities.
- Research into space weathering processes that alter airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MG32
- Material: Magnesium Fluoride (MgF2)
- Size: 3''
- Thickness: 0.250''
- Product code: NG0ST01MG32
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