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Magnesium (Mg) Sputtering Targets

Magnesium (Mg) Sputtering Targets
Regular price Rp 7.041.000,00
Regular price Sale price Rp 7.041.000,00
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Magnesium (Mg) sputtering targets are solid metallic source materials used in physical vapor deposition (PVD). During sputtering, magnesium atoms are ejected from the target surface and deposited onto a substrate to form thin films. As a lightweight alkaline earth metal, magnesium belongs to the group of metallic sputtering targets used in research-scale thin film development.

  • Quantity: 1 piece

For technical specifications, CoA, or quotations, please contact AMI Scientific.

  • Thin film deposition research on laboratory sputtering systems
  • Development of magnesium-based coatings for optical and electronic components
  • Fabrication of magnesium-containing layers for materials and surface science studies
  • Process optimization and deposition parameter studies in PVD

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