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Magnesium (Mg) Sputtering Targets

Magnesium (Mg) Sputtering Targets
Regular price Rp 9.402.000,00
Regular price Sale price Rp 9.402.000,00
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Magnesium (Mg) sputtering targets are solid metal sources used in physical vapor deposition (PVD). Energetic ions bombard the target surface, ejecting magnesium atoms that condense on a substrate to form thin films. Magnesium is a lightweight alkaline earth metal, and this product belongs to the metal sputtering target category.

  • 1 piece

For technical specifications, CoA, or a quotation, please contact AMI Scientific.

  • Thin-film deposition research on glass, silicon, and other substrates
  • Prototyping of electronic and optical thin-film layers
  • Studies of magnesium-based alloy and compound films
  • Surface and interface research in materials science

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