Magnesium (Mg) sputtering targets are solid metal sources used in physical vapor deposition (PVD), a thin-film technique in which target atoms are ejected by ion bombardment and deposited onto a substrate. Magnesium is a lightweight alkaline earth metal, and its targets belong to the class of metallic sputtering materials used to produce uniform metallic and compound thin films for laboratory and industrial use.
- Quantity: 1 piece
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- Deposition of magnesium-based thin films for materials science research
- Research on hydrogen storage and energy materials using metallic thin layers
- Thin-film electrode and battery component development studies
- Protective and functional metallic coatings on optical or electronic substrates
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