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Magnesium (Mg) Sputtering Targets

Magnesium (Mg) Sputtering Targets
Regular price Rp 9.595.000,00
Regular price Sale price Rp 9.595.000,00
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Magnesium (Mg) sputtering targets are solid metallic plates used as source material in physical vapor deposition (PVD) processes. During sputtering, energetic ions bombard the target surface and eject magnesium atoms, which condense onto a substrate to form thin films. Magnesium is a lightweight alkaline earth metal, and its targets are widely used in research on functional coatings and energy-related thin-film devices.

  • 1 piece

For technical specifications, CoA, or quotations, please contact AMI Scientific.

  • Thin-film deposition research for optical and protective coatings
  • Electrode and interlayer film studies in battery and energy-storage research
  • Surface and alloy investigations in materials science laboratories
  • Development of magnesium-based compound films, such as MgO, through reactive sputtering

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