Magnesium (Mg) sputtering targets are solid metal plates used as source material in physical vapor deposition (PVD). Magnesium is a lightweight alkaline earth metal. During sputtering, ions bombard the target surface in a vacuum chamber, ejecting atoms that condense onto a substrate to form a thin film. This makes the product a metal target for thin film deposition research.
- 1 piece
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- Deposition of metallic magnesium thin films for materials research
- Reactive sputtering of magnesium-based oxide or nitride films
- Surface coating studies for energy storage and hydrogen materials research
- Prototyping of thin film layers for optical and electronic devices
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