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Magnesium (Mg) Sputtering Targets

Magnesium (Mg) Sputtering Targets
Regular price Rp 10.989.000,00
Regular price Sale price Rp 10.989.000,00
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Magnesium (Mg) sputtering targets are solid metallic sources of magnesium, a lightweight alkaline-earth metal. They are used in physical vapor deposition (PVD) processes, where sputtering bombards the target surface to deposit a thin magnesium-based film onto a substrate. Magnesium targets belong to the metal sputtering target group and are commonly used in research and development laboratories and pilot-scale thin-film work.

  • Quantity: 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotation, please contact AMI Scientific.

  • Thin-film deposition research for optical and protective coatings
  • Development of magnesium-based alloy and hydride films for hydrogen storage studies
  • Electrode and interface layer research for battery and energy device prototypes
  • Conductive and functional coating studies for electronics and materials science

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