This magnesium (Mg) sputtering target has a purity of 99.95%, a size of 6'' and a thickness of 0.250''. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering can coat substrates of many shapes and sizes with thin films. The process is repeatable, works for small research and development projects, and can be scaled to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place on the target surface, in flight or on the substrate. The number of adjustable parameters makes sputter deposition complex, but it gives experienced users considerable control over film growth and microstructure.
- Deposition of thin magnesium films onto substrates such as silicon wafers.
- Sputter etching where a high degree of etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, as in secondary ion mass spectroscopy (SIMS), to determine composition and detect very low impurity concentrations.
- Studies related to space weathering, which alters the physical and chemical properties of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MG18
- Material: Magnesium (Mg)
- Size: 6''
- Thickness: 0.250''
- Product code: NG0ST01MG18
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