Magnesium (Mg) sputtering targets are solid metal sources used in physical vapor deposition (PVD) to produce thin films through sputtering. Magnesium is a lightweight alkaline earth metal, and this target belongs to the metallic sputtering material group, suited for depositing magnesium-containing layers in research settings. Target geometry and handling should be matched to the sputtering system used. As a reactive metal, magnesium requires careful storage and processing to maintain target integrity.
- Quantity: 1 piece
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- Thin film deposition research on magnesium-based metallic coatings
- Development of magnesium-containing layers for battery and energy storage studies
- Fabrication of test films for optical and electronic device research
- Alloy and multilayer film development in academic and industrial laboratories
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