Magnesium Oxide (MgO) sputtering targets are ceramic oxide materials used as source targets in physical vapor deposition (PVD) processes. During sputtering, energetic ions eject atoms from the target surface, which then condense onto a substrate to form thin films. MgO belongs to the alkaline earth metal oxide group and is valued for its electrical insulation, wide optical transparency, and chemical stability.
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- Tunnel barrier layers in magnetic tunnel junction (MTJ) research for spintronic devices
- Insulating and dielectric thin films in electronic and semiconductor research
- Buffer and seed layers for epitaxial growth of oxide and nitride films
- Protective and optical coatings in thin-film research and development
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