This magnesium oxide (MgO) sputtering target from Nanografi has a purity of 99.95%, a diameter of 2'' and a thickness of 0.125'', and is supplied in an indium version. It serves as the source material for depositing MgO thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Sputter deposition can coat a wide range of substrate shapes and sizes. The process is repeatable, so work that begins at small research and development scale can move to production batches covering medium to large substrate areas.
Depending on the process settings, chemical reactions may take place at the target surface, in flight, or on the substrate. The large number of adjustable parameters makes sputtering a complex technique, but it gives experienced users close control over film growth and microstructure.
- Deposition of magnesium oxide thin films onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Materials analysis by etching away target material, as in secondary ion mass spectrometry (SIMS).
- Research into space weathering, the sputtering process that alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MG57
- Material: Magnesium Oxide (MgO)
- Size: 2''
- Thickness: 0.125''
- Version: Indium
- Product code: NG0ST01MG57
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