This magnesium oxide (MgO) sputtering target from Nanografi is a 4'' diameter, 0.125'' thick disc with 99.95% purity and an indium bond. It serves as the source material for depositing MgO thin films in sputter deposition systems.
Sputtering lets labs coat substrates of many shapes and sizes with thin films, and the process is repeatable. It suits small research and development work and can be scaled to production batches covering medium to large substrate areas.
Depending on process parameters, chemical reactions may take place on the target surface, in flight, or on the substrate. The number of adjustable parameters makes sputter deposition complex, but it gives experienced users close control over film growth and microstructure.
- Deposition of thin films by eroding material from the target onto substrates such as silicon wafers.
- Sputter etching where a high degree of etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
- Studies related to space weathering, where sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MG61
- Material: Magnesium Oxide (MgO)
- Size: 4''
- Thickness: 0.125''
- Bonding: Indium
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