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Nanografi

Magnesium Oxide (MgO) Sputtering Targets

Magnesium Oxide (MgO) Sputtering Targets
Regular price Rp 27.786.000,00
Regular price Sale price Rp 27.786.000,00
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Magnesium oxide (MgO) sputtering targets are solid ceramic oxide sources made from magnesium oxide, an alkaline earth oxide. They serve as source material in physical vapor deposition (PVD), where sputtering transfers the material onto a substrate to form thin films. Nanografi nanomaterial targets are supplied as solid pieces for controlled film deposition in research settings.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Insulating and dielectric thin films in electronic device research
  • Tunnel barrier layers in magnetic tunnel junction studies
  • Buffer and seed layers for epitaxial oxide film growth
  • Protective coatings in optical and optoelectronic research

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