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Magnesium Oxide (MgO) Sputtering Targets

Magnesium Oxide (MgO) Sputtering Targets
Regular price Rp 29.915.000,00
Regular price Sale price Rp 29.915.000,00
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Magnesium Oxide (MgO) sputtering targets are dense ceramic oxide sources used in physical vapor deposition (PVD) to form thin films of magnesium oxide. MgO belongs to the group of alkaline earth metal oxides, valued for its electrical insulation, wide bandgap, and chemical stability. During sputtering, energetic ions bombard the target surface and eject material that condenses onto a substrate.

  • Quantity: 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotations, please contact AMI Scientific.

  • Dielectric and insulating layers in thin-film electronic devices
  • Tunnel barrier layers in magnetic tunnel junction research
  • Protective and secondary-electron-emitting coatings in display research
  • Buffer or seed layers for growth of complex oxide thin films
  • Optical coatings for transparent and UV-related thin-film studies

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