This magnesium oxide (MgO) sputtering target from Nanografi is a 99.95% purity disc measuring 2'' across and 0.125'' thick. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established way to grow thin films from many different materials on substrates of varied shapes and sizes. The process is repeatable and scales from small research and development work up to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions can take place on the target surface, in flight or on the substrate. The number of adjustable parameters makes sputter deposition complex, but it gives experienced users considerable control over film growth and microstructure.
- Thin film deposition onto substrates such as silicon wafers by sputtering.
- Sputter etching where highly anisotropic etching is required and selectivity is not a concern.
- Surface analysis methods that etch away target material, such as secondary ion mass spectrometry (SIMS), to determine composition and detect trace impurities.
- Research related to space weathering, in which sputtering alters the physical and chemical properties of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MG42
- Material: Magnesium Oxide (MgO)
- Size: 2''
- Thickness: 0.125''
- Product code: NG0ST01MG42
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