This magnesium oxide (MgO) sputtering target from Nanografi is a source material for depositing MgO thin films by sputtering. It has a purity of 99.95%, a size of 3'' and a thickness of 0.125'', and is supplied as a single piece.
In sputter deposition, material is eroded from the target and transferred onto a substrate such as a silicon wafer. The technique works with substrates of many shapes and sizes, gives repeatable results, and can move from small R&D runs to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place at the target surface, in flight or on the substrate. Because so many parameters can be adjusted, sputtering gives experienced users close control over film growth and microstructure.
- Thin film deposition of MgO onto substrates such as silicon wafers.
- Sputter etching where a high degree of etching anisotropy is required and selectivity is not critical.
- Materials analysis by sputtering, such as secondary ion mass spectrometry (SIMS) for determining composition and detecting trace impurities.
- Research into space weathering processes affecting airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MG44
- Material: Magnesium Oxide (MgO)
- Size: 3''
- Thickness: 0.125''
- Product code: NG0ST01MG44
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