This magnesium oxide (MgO) sputtering target from Nanografi is a source material for depositing thin films by sputtering. It is supplied with a purity of 99.95%, a size of 4'' and a thickness of 0.125'', sold as a single piece.
In sputter deposition, material is eroded from the target and transferred onto a substrate such as a silicon wafer. The technique works with many substrate shapes and sizes, gives repeatable results and can move from small research projects to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place at the target surface, in flight or on the substrate. Although these many variables make sputtering a complex process, they give experienced users a high degree of control over film growth and microstructure.
- Deposition of MgO thin films onto substrates such as silicon wafers.
- Sputter etching where strong etching anisotropy is required and selectivity is not a concern.
- Analytical work such as secondary ion mass spectrometry (SIMS), where sputtered atoms are measured to determine composition and trace impurities.
- Research into sputtering as a form of space weathering on airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MG46
- Material: Magnesium Oxide (MgO)
- Size: 4''
- Thickness: 0.125''
- Product code: NG0ST01MG46
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