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Magnesium Oxide (MgO) Sputtering Targets

Magnesium Oxide (MgO) Sputtering Targets
Regular price Rp 55.343.000,00
Regular price Sale price Rp 55.343.000,00
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Magnesium oxide (MgO) is an inorganic ceramic oxide compound. MgO sputtering targets are solid, dense target materials used as the source in physical vapor deposition (PVD) processes, where sputtering deposits thin films of the material onto a substrate. They are widely used in research laboratories and thin-film development.

  • Quantity: 1 piece

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  • Tunnel barrier layers in magnetic tunnel junction research
  • Protective and dielectric thin films in electronic and optoelectronic device studies
  • Buffer layers for the growth of oxide thin films
  • Insulating layers in thin-film device prototyping

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