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Magnesium Oxide (MgO) Sputtering Targets

Magnesium Oxide (MgO) Sputtering Targets
Regular price Rp 22.445.000,00
Regular price Sale price Rp 22.445.000,00
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Magnesium Oxide (MgO) sputtering targets are ceramic source materials used in physical vapor deposition (PVD) to produce thin films. MgO is a metal oxide in the ceramic and dielectric material group, known for its electrical insulation and stable chemical behavior. Targets of this type are consumed during sputtering to deposit MgO layers onto substrates.

  • Quantity: 1 piece

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  • Deposition of dielectric and insulating thin films in electronic device research
  • Buffer and barrier layers in thin-film and multilayer structure studies
  • Optical coating development for transparent oxide films
  • Protective coating research for surface and substrate engineering

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