Magnesium Oxide (MgO) sputtering targets are solid ceramic oxide plates used as the source material in physical vapor deposition (PVD). During sputtering, energetic ions bombard the target surface, ejecting MgO atoms that condense onto a substrate to form a thin film. MgO belongs to the oxide ceramics group and is valued for its electrical insulation and chemical stability.
- Quantity: 1 piece
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- Dielectric and insulating thin films in microelectronics research
- Buffer or seed layers for the epitaxial growth of oxide films
- Optical coating development for research prototypes
- Protective layer studies for functional surfaces
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