This magnesium oxide (MgO) sputtering target from Nanografi is a 6'' target with a thickness of 0.125'' and a purity of 99.95%. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established way to coat substrates of many shapes and sizes with thin films. The process is repeatable, so work started in small research and development projects can be scaled up to production batches covering medium to large substrate areas.
Depending on process parameters, chemical reactions may take place on the target surface, in flight or on the substrate. The large number of adjustable parameters makes sputter deposition complex, but it gives experienced users considerable control over film growth and microstructure.
- Thin film deposition of MgO onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect trace impurities.
- Research and development work that can be scaled up to production batches on medium to large substrate areas.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MG50
- Material: Magnesium Oxide (MgO)
- Size: 6''
- Thickness: 0.125''
- Product code: NG0ST01MG50
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