Magnesium oxide (MgO) sputtering targets are ceramic oxide targets from the Nanografi line, designed for physical vapor deposition (PVD) processes such as sputtering. MgO belongs to the group of inorganic metal oxide ceramics, valued for its electrical insulation, chemical stability, and optical transparency. During deposition, the target material is sputtered onto a substrate to form a thin film.
- Quantity: 1 piece
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- Deposition of insulating and dielectric thin films in electronics research
- Buffer layers for growing oxide films on single-crystal substrates
- Protective and barrier coatings studied in materials science
- Optical thin-film research requiring transparent oxide layers
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