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Magnesium Oxide (MgO) Sputtering Targets

Magnesium Oxide (MgO) Sputtering Targets
Regular price Rp 45.706.000,00
Regular price Sale price Rp 45.706.000,00
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Magnesium oxide (MgO) sputtering targets are solid ceramic oxide plates used in physical vapor deposition (PVD), a thin-film process in which atoms are ejected from the target surface and deposited onto a substrate. MgO belongs to the group of inorganic metal oxides and is valued for its electrical insulation, chemical stability, and wide optical transparency. Its crystal structure and oxide chemistry make it a common choice for depositing functional thin layers in research settings.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, Certificate of Analysis (CoA), or a quotation.

  • Deposition of dielectric and insulating thin films in electronic device research
  • Buffer and seed layers for growing oxide and semiconductor films
  • Protective and barrier coatings in materials science studies
  • Optical thin films for transparent coating development

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