Magnesium oxide (MgO) sputtering targets are solid ceramic metal-oxide sources used in physical vapor deposition (PVD) to form thin films. As an inorganic oxide ceramic, MgO is valued for its electrical insulation and chemical stability, which makes it a common target material for oxide thin-film research and device fabrication.
- Quantity: 1 piece
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- Deposition of insulating and dielectric thin films in electronic devices
- Buffer and seed layers for oxide and semiconductor thin-film growth
- Protective and barrier coatings in optical and functional films
- Academic and industrial research on oxide thin-film processes
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