This magnesium oxide (MgO) sputtering target from Nanografi is a 99.95% purity source material for depositing thin films by sputtering. Each piece measures 8'' in size with a thickness of 0.250''.
In sputter deposition, material is eroded from the target and transferred onto a substrate such as a silicon wafer. The method works on substrates of many shapes and sizes, gives repeatable results, and scales from small research and development work up to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions can take place on the target surface, in flight or on the substrate. Although the large number of variables makes sputtering a complex technique, it gives experienced users considerable control over film growth and microstructure.
- Thin film deposition of magnesium oxide onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not a concern.
- Material analysis by etching, for example secondary ion mass spectrometry (SIMS), where sputtered atoms are identified and quantified to determine composition and detect trace impurities.
- Research into sputtering as a form of space weathering affecting airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MG55
- Material: Magnesium Oxide (MgO)
- Size: 8''
- Thickness: 0.250''
- Product code: NG0ST01MG55
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