Manganese (Mn) sputtering targets are solid, high-density plates or discs of manganese metal, designed for physical vapor deposition (PVD) processes such as DC or RF magnetron sputtering. In this process, the target is bombarded with energetic ions so that manganese atoms are ejected and deposited as a thin film onto a substrate. Manganese is a transition metal, and its targets are widely used in thin-film research. The product title also references indium, so any indium bonding or backing details should be confirmed with AMI Scientific before ordering.
- 1 piece
For technical specifications, Certificate of Analysis (CoA), or a quotation, please contact AMI Scientific.
- Thin-film deposition for magnetic and spintronic device research
- Fabrication of manganese-containing alloy or oxide films in laboratory settings
- Development of electrode and functional coating layers
- Process development and optimization in academic PVD systems
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