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Nanografi

Manganese (Mn) Sputtering Targets

Manganese (Mn) Sputtering Targets
Regular price Rp 13.543.000,00
Regular price Sale price Rp 13.543.000,00
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Manganese (Mn) sputtering targets are solid metallic source materials used in physical vapor deposition (PVD) processes, such as magnetron sputtering, to deposit thin manganese-based films onto substrates. Manganese is a transition metal, and its magnetic and electronic properties make it a common subject of thin-film research.

  • 1 piece

For technical specifications, certificate of analysis (CoA), or a quotation, please contact AMI Scientific.

  • Deposition of thin metallic and alloy films for materials research
  • Magnetic thin-film and spintronics device research
  • Development of functional coatings on semiconductor and glass substrates
  • Academic and industrial process development in PVD systems

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