This manganese (Mn) sputtering target from Nanografi is a 3'' disc, 0.250'' thick, with a purity of 99.95%. It serves as the source material in sputter deposition systems, where atoms are eroded from the target and deposited as a thin film on a substrate such as a silicon wafer.
Sputter deposition works on a wide range of materials and on substrates of many shapes and sizes. The process is repeatable, so it can move from small R&D experiments to production batches covering medium to large substrate areas. Depending on the process parameters, chemical reactions may take place at the target surface, in flight, or on the substrate itself.
Because so many parameters can be tuned, sputtering is a complex technique, but it gives experienced users fine control over film growth and microstructure.
- Thin film deposition of manganese onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Material analysis by controlled sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect trace impurities.
- Studies related to space weathering, where sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MN06
- Material: Manganese (Mn)
- Size: 3''
- Thickness: 0.250''
- Product code: NG0ST01MN06
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