Molybdenum disilicide (MoSi2) is an intermetallic compound of molybdenum and silicon, known for its high-temperature stability and resistance to oxidation. This sputtering target is designed for physical vapor deposition (PVD), where the target material is sputtered to form thin films on a substrate. The product listing also references indium, which may indicate a bonding or backing material; please confirm the target configuration with our team.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Thin-film deposition for high-temperature and oxidation-resistant coating research
- Development of silicide-based layers in electronic and semiconductor device studies
- Materials research on protective coatings for demanding thermal environments
- Academic and industrial laboratory work on sputtered metallic and intermetallic films
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