This molybdenum disilicide (MoSi2) sputtering target from Nanografi is a 1'' disc, 0.125'' thick, with a purity of 99.95%. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering can coat substrates of many shapes and sizes, and the process is repeatable. It suits small research and development work and can be scaled up to production batches covering medium to large substrate areas. Depending on process settings, chemical reactions may take place at the target surface, in flight or on the substrate, and the many adjustable parameters give experienced users close control over film growth and microstructure.
- Deposition of MoSi2 thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, such as secondary ion mass spectrometry (SIMS) to determine composition and detect trace impurities.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MO23
- Material: Molybdenum Disilicide (MoSi2)
- Size: 1''
- Thickness: 0.125''
- Product code: NG0ST01MO23
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