This molybdenum disilicide (MoSi2) sputtering target from Nanografi is a source material for depositing MoSi2 thin films by sputtering. It has a purity of 99.95%, a size of 1'' and a thickness of 0.250'', and is supplied as a single piece.
Sputter deposition works by eroding material from the target and transferring it onto a substrate such as a silicon wafer. The method suits substrates of many shapes and sizes, gives repeatable results, and can move from small research and development work up to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place at the target surface, in flight or on the substrate. The number of adjustable parameters makes sputtering a demanding process, but it gives experienced users fine control over film growth and microstructure.
- Thin film deposition of MoSi2 onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Material analysis by sputtering, for example in secondary ion mass spectrometry (SIMS) to determine composition and detect very low impurity levels.
- Research related to space weathering, in which sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MO24
- Material: Molybdenum Disilicide (MoSi2)
- Size: 1''
- Thickness: 0.250''
- Product code: NG0ST01MO24
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