Molybdenum disilicide (MoSi2) is an intermetallic silicide compound formed from molybdenum and silicon. It belongs to the transition metal silicide family and is supplied here as a sputtering target for physical vapor deposition (PVD) of thin films. Its combination of metallic and ceramic-like characteristics makes it a common choice for research on protective and functional coatings.
- Quantity: 1 piece
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- Deposition of oxidation-resistant coatings for high-temperature components
- Thin-film silicide layers for microelectronics research, such as contact and interconnect studies
- Functional and protective thin films for materials science investigations
- Development of multilayer and composite coating systems in laboratory settings
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