Molybdenum disilicide (MoSi2) is an intermetallic compound of molybdenum and silicon, known for its high-temperature stability and resistance to oxidation. Supplied as a sputtering target, it serves as the source material for physical vapor deposition of MoSi2 thin films in research and development.
- Quantity: 1 piece
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- Thin-film contact and barrier layer studies in microelectronics research
- Oxidation-resistant coatings for high-temperature components
- Deposition process development for silicide-based functional films
- Surface engineering research on protective coatings
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