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Molybdenum Disilicide (MoSi2) Sputtering Targets

Molybdenum Disilicide (MoSi2) Sputtering Targets
Regular price Rp 26.586.000,00
Regular price Sale price Rp 26.586.000,00
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Molybdenum disilicide (MoSi2) is an intermetallic silicide compound formed from molybdenum and silicon. It is known for its stability at high temperatures and its resistance to oxidation, which makes it a common subject of materials research in high-temperature and protective-coating applications. This sputtering target is a solid source material used in physical vapor deposition (PVD) to produce thin films of MoSi2 on substrates.

  • Quantity: 1 piece

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  • Research on oxidation-resistant and high-temperature protective coatings
  • Thin-film contact and diffusion barrier layer studies in microelectronics
  • Development of heating element and structural coating materials
  • Surface engineering and thin-film process development in laboratory settings

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