Molybdenum disilicide (MoSi2) is an intermetallic silicide compound formed from molybdenum and silicon. It is known for its stability at high temperatures and its resistance to oxidation, which makes it a common subject of materials research in high-temperature and protective-coating applications. This sputtering target is a solid source material used in physical vapor deposition (PVD) to produce thin films of MoSi2 on substrates.
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- Research on oxidation-resistant and high-temperature protective coatings
- Thin-film contact and diffusion barrier layer studies in microelectronics
- Development of heating element and structural coating materials
- Surface engineering and thin-film process development in laboratory settings
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