Molybdenum disilicide (MoSi2) is an intermetallic compound of molybdenum and silicon. Supplied as a sputtering target, it serves as the source material for physical vapor deposition of MoSi2 thin films, which are widely studied for their high-temperature stability and oxidation resistance. This Nanografi sputtering target is suited to laboratory and pilot-scale thin-film deposition.
- Quantity: 1 piece
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- Research on high-temperature oxidation-resistant coatings
- Thin-film contact and diffusion barrier studies in microelectronics
- Deposition of silicide layers for materials science investigations
- Protective coating development for heating elements and structural components
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